Title:
化合物、樹脂、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7389566
Kind Code:
B2
Abstract:
To provide a compound, a resin, and a resist composition capable of producing a resist pattern having good CD uniformity (CDU).SOLUTION: There are provided: a monomer (1A) having one alkoxy group and two ester groups or a monomer (1B) having two (meth)acrylic groups or two styryl groups and having two ester groups, the monomer (1A) or the monomer (1B) being a (meth)acrylic acid derivative or a styrene derivative; a resin comprising the monomers; and a resist composition containing the resin.SELECTED DRAWING: None
Inventors:
Masahiko Shimada
Kaoru Araki
Koji Ichikawa
Kaoru Araki
Koji Ichikawa
Application Number:
JP2019102189A
Publication Date:
November 30, 2023
Filing Date:
May 31, 2019
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C08F20/22; C07C69/54; C08F12/20; C08F12/22; C08F20/24; C08F20/26; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2019214708A | ||||
| JP2019218335A | ||||
| JP2019214553A | ||||
| JP2019210465A | ||||
| JP2019210280A | ||||
| JP2018062508A | ||||
| JP2018062506A |
Other References:
Journal of Fluorine Chemistry,2011年,Vol.132,No.10,p.760-766
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP