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Patent Searching and Data


Title:
トリアゼニド配位子を有する金属錯体及び気相から金属を堆積させるためのその使用
Document Type and Number:
Japanese Patent JP7480041
Kind Code:
B2
Abstract:
The invention relates to the use of a metal complex, which has at least one ligand of the formula R1—N3—R2, wherein R1 and R2 are hydrocarbon moieties, for depositing the metal or a compound of the metal from the gas phase. The invention further relates to methods for depositing metals from the metal complexes, and to metal complexes, substituted triazene compounds and to methods for the production thereof.

Inventors:
Jork Sundermeier
Zuzane Pulls
Fabian Schroeder
Application Number:
JP2020532735A
Publication Date:
May 09, 2024
Filing Date:
December 12, 2018
Export Citation:
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Assignee:
Umicore AG & Co.KG
International Classes:
C23C16/18; C07C245/24; C07F15/00
Domestic Patent References:
JP2016540038A
JP6263780A
Foreign References:
US20160273106
US20120108062
US5523436
Other References:
OUSSAMA M.EL-KADRI ET AL.,Film growth precursor development for metal nitrides. Synthesis, structure, and volatility of molybdenum(vi) and tungsten(vi) complexs containing bis(imido)metal fragments and various nitrogen donor ligands,DALTON TRANSACTIONS,英国,2006年01月01日,No.16,1943-1953,SR引用文献
KHALED SOUSSI ET AL.,Asymmetrically substituted triazenes as poor electron donor ligands in the precusor chemistry of iron(II) for iron-based metallic and intermetallic nanocrystals,DALTON TRANSACTIONS,英国,2017年01月01日,Vol.46 No.38,13055-13064,SR引用文献
Attorney, Agent or Firm:
Yasuhiko Murayama
Shinya Mihiro
Tatsuhiko Abe