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Patent Searching and Data


Document Type and Number:
Japanese Patent JPH0459929
Kind Code:
B2
Abstract:
In reaction injection molding facilities of the recirculation type, a closed loop system controls the addition of a gas to a mixture of liquid and gas. The system takes a sample volume of the liquid and forces a plunger into the sample volume. The distance travelled by the plunger between two preset pressures of the sample is measured and compared to a reference distance to get a control signal that is used to operate a valve that controls gas admission to the mixture.

Inventors:
GIRUBAATO RATSUSERU BERANJII
ROBAATO JOZEFU DORANZUMAN
KAABII RII SUTOON
Application Number:
JP9296987A
Publication Date:
September 24, 1992
Filing Date:
April 15, 1987
Export Citation:
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Assignee:
CINCINNATI MILACRON INC
International Classes:
B29C39/24; B01J4/00; B01J4/02; B29B7/76; B29B7/80; B29C45/17; B29C67/20; C08F2/00; G05D11/00; B29K75/00; B29K105/04