Title:
【発明の名称】基板表面上に位相シフトを持つ格子構造を製作する方法
Document Type and Number:
Japanese Patent JPH0693045
Kind Code:
B2
Abstract:
A method for generating a lattice structure with a phase shift on a surface of a substrate characterized by the steps of exposing of a photo-sensitive surface in an optical interference field and then subsequently exposing the same surface to a second interference field with the spatial frequencies of the two interference fields being changed a small amount between the two exposures. The photo-sensitive surface can be a photoresist layer applied on the substrate. After developing of the layer, this lattice structure is produced by etching. Another embodiment of the method is produced by means of a laser-active etching wherein the photo-sensitive surface is compound of a substrate surface in contact with an etchant and the etchant reaction is activated by the exposure.
Inventors:
Gerhard, Heise
Ulrich, Wolf
Richard, Matsu
Ulrich, Wolf
Richard, Matsu
Application Number:
JP26050886A
Publication Date:
November 16, 1994
Filing Date:
October 31, 1986
Export Citation:
Assignee:
Siemens, Actien Gezershaft
International Classes:
G02B5/18; G02B5/32; G02B6/12; G02B6/122; G03F7/00; G03F7/20; G03H1/04; H01S5/00; (IPC1-7): G02B5/18
Attorney, Agent or Firm:
Tomimura Kiyoshi
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