Title:
【発明の名称】化学気相成長法
Document Type and Number:
Japanese Patent JPH0713944
Kind Code:
B2
More Like This:
| JP4342832 | Semiconductor devices and their manufacturing methods |
| JPH10214762 | SEMICONDUCTOR MANUFACTURING DEVICE |
| JP4916140 | Vacuum processing system |
Inventors:
Okuhira Hidekazu
Akira Shintani
Yasuo Wada
Tamura Norio
Natsuaki Nobuyoshi
Shoji Sukuri
Tadashi Suzuki
Kiyoshi Miyake
Shizuka Oyu
Nakatani Mitsuo
Susumu Tsutake
Nishitani Eisuke
Akira Shintani
Yasuo Wada
Tamura Norio
Natsuaki Nobuyoshi
Shoji Sukuri
Tadashi Suzuki
Kiyoshi Miyake
Shizuka Oyu
Nakatani Mitsuo
Susumu Tsutake
Nishitani Eisuke
Application Number:
JP6068785A
Publication Date:
February 15, 1995
Filing Date:
March 27, 1985
Export Citation:
Assignee:
株式会社日立製作所
International Classes:
H01L21/02; H01L21/205; H01L21/263; H01L21/285; H01L21/31; H01L27/12; (IPC1-7): H01L21/205
Other References:
【文献】アプライド・フィイジクス・レター(Appl.phys・Lett)45(6),617(1984)
Attorney, Agent or Firm:
Katsuo Ogawa (1 person outside)
Next Patent: 同期駆動装置の保安装置