Title:
【発明の名称】後段質量選択減速(POST MASS SELECTION DECELERATION)型イオン注入装置
Document Type and Number:
Japanese Patent JPH10512710
Kind Code:
A
Abstract:
PCT No. PCT/GB96/02740 Sec. 371 Date Sep. 8, 1997 Sec. 102(e) Date Sep. 8, 1997 PCT Filed Nov. 8, 1996 PCT Pub. No. WO97/17716 PCT Pub. Date May 15, 1997A post mass selection decel lens (9) is located between the exit aperture (55) of the mass selection chamber (47) and the entry (74) to the electron confinement tube (69) of the PFS. The lens comprises a first electrode (65) at the substrate potential, a second electrode (60) at the flight tube potential, and a field electrode (61) between them at a relatively high (negative) potential sufficient to provide focusing of the ion beam at the first electrode. The first electrode is larger than the beam to avoid deflecting ions at the periphery of the aperture out of the beam. The first electrode has an aperture which is smaller than that of the field electrode. The field electrode is at least -5 kV relative to the flight tube, that is substantially more than required for electron suppression. Additional apertures are provided between the process chamber and the mass selection chamber to improve evacuation.
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Inventors:
England, Jonathan, Gerald
Moffat, Stefan
Armor, Dave George
Ford, Masjid
Moffat, Stefan
Armor, Dave George
Ford, Masjid
Application Number:
JP51799497A
Publication Date:
December 02, 1998
Filing Date:
November 08, 1996
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
H01J37/05; H01J37/30; H01J37/317; (IPC1-7): H01J37/317; H01J37/05
Attorney, Agent or Firm:
Yoshiki Hasegawa (4 outside)