Document Type and Number:
Japanese Patent JPS5014996
Kind Code:
B1
Abstract:
1358416 Masking arrangement for vapour deposition WESTINGHOUSE ELECTRIC CORP 6 Sept 1971 [24 Sept 1970] 41425/71 Heading C7F [Also in Division H1] Apparatus for vacuum vapour deposition has a plurality of masks 34, 36, 38, 40 arranged in series for presentation at a deposition station, means including a rotatable wheel 12 for mounting and moving each mask sequentially into and out of the said station, said mounting and moving means including a servomotor 26 and photodetection means operatively connected thereto, and a light source associated with the photodetection means, the wheel 12 being between the light source and detection means and having a number of openings equal to the number of masks for transmission of light beams, whereby each mask on the wheel is brought into substantial registration with the substrate material at the deposition station when the light beam activates the photo-detection means, a housing 14 for storing substrate material having a substrate - mounting surface spaced from the deposition station, means 16 for holding a source of material to be deposited, this being on the opposite side of the masks to the housing 14, a shutter 22 between the source 16 and wheel 12, means (such as bell-crank 20, pivoted at 102) for moving the substrate into and out of registry with the deposition station, means (such as tapered pin 54) for precisely aligning the mask and substrate, means for moving housing 14 and wheel 12 away from each other, and walls forming an evacuable chamber to contain the above. The substrate may be an elongated flexible body wound between two reels 72 and 74 held on housing 14 which itself is mounted on trunnions 92 on bifurcated arm 98 of crank 20; pin 54 may align the substrate and mask and also mask holder 42. Evaporation is by induction or electron-beam heating; the substrate may be glass, paper, plastics, Ni, Al, Cu, Sn, Ta, Fe, or alloys thereof, and coatings mentioned are Au, Al, Ag, Ni, Cu, Sn, Pt, SiO, SiO 2 , Al 2 O 3 , CaF 2 , MgF 2 , CdS, CdSe, Si, InAs, GaAs, Sn oxide, PbTe, Te, CdS, and polymers of hexachlorobutadiene, divinylbenzene, aryl sulphones, fluorinated alkenyls and p-xylene.
Application Number:
JP6918471A
Publication Date:
May 31, 1975
Filing Date:
September 07, 1971
Export Citation:
International Classes:
C23C14/04; H01L21/67; (IPC1-7): C23C13/10; H01L21/203; H01L21/285