Document Type and Number:
Japanese Patent JPS5018634
Kind Code:
A
Abstract:
Compounds corresponding to the general formulae: XR4 PARALLEL ¦ R-N-C-N-C-CH2-CH2-S-CH3 (I) ¦¦¦ R1R2R3 X PARALLEL C-N-R2 ¦ R-N ANGLE ¦ ¦ C-C-CH2-CH2-S-CH3 (II) PARALLEL ¦ OR3 in which R represents hydrogen, an alkyl radical, a halogenated alkyl radical, a cycloalkyl radical, an optionally substituted aryl radical, an optionally substituted aralkyl radical, an acyl radical, aroyl radical or an optionally substituted heterocycle; R1 and R3, which may be the same or different, represent hydrogen, aralkyl radical containing 1 to 5 carbon atoms; R2 represents hydrogen, an alkyl radical (optionally halogenated or substituted by a hydroxyl), a formyl radical, an acyl radical, a carbamoyl radical monosubstituted or disubstituted on the nitrogen; R and R2 cannot both represent hydrogen; R4 is the carboxylic acid radical or one of its ester, amide, nitrile derivatives or a salt of an alkaline metal, alkaline-earth metal or heavier metal, in which case several molecules (1) can be associated with the metal atom; X represents oxygen or sulphur, and their salts, especially their sulphonium salts. Such compounds are useful for modifying the growth of plants.
More Like This:
| JP5119214 | Slime control method in water system |
| JP2001311095 | BACTERICIDAL DETERGENT COMPOSITION |
| JPS53121941 | BACTERICIDE |
Application Number:
JP5775574A
Publication Date:
February 27, 1975
Filing Date:
May 21, 1974
Export Citation:
International Classes:
A01N43/50; A01N47/28; A01N47/30; A01N47/32; A01N47/34; A01P21/00; C07C67/00; C07C313/00; C07C323/44; C07C323/59; C07C325/00; C07C335/04; C07D233/72; C07D233/76; C07D401/04; C07D405/06; (IPC1-7): C07D49/32