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Title:
GAS SOFT NITRIDING METHOD
Document Type and Number:
Japanese Patent JPS58174572
Kind Code:
A
Abstract:

PURPOSE: To attain to increase a nitriding speed to a large extent, to reduce operation cost and to enhance safety, by adding CO2 to a gaseous soft nitriding atmosphere comprising an N2 gas, an NH3 gas and an org. solvent decomposing gas to subject a material to be treated to gaseous soft nitridation.

CONSTITUTION: A CO2 gas is added to a gaseous soft nitriding atmosphere comprising an N2 gas, an NH3 gas and an org. solvent decomposing gas such as a methanol decomposing gas in an amount of 0.1W10vol%. By using this CO2 added gaseous soft nitriding atmosphere, a material to be treated is subjected to gaseous soft nitriding treatment within a temp. range of 450W650°C. When the CO2 gas is added to mentioned above, CO2 is reacted with a H2 gas imparting bad influence to nitriding reaction to lower H2 partial pressure and, therefore, a nitriding speed can be accerelated.


Inventors:
KAWADA KAZUYOSHI
Application Number:
JP5500882A
Publication Date:
October 13, 1983
Filing Date:
April 02, 1982
Export Citation:
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Assignee:
ORIENTAL ENGINEERING CO
International Classes:
C23C8/32; C23C8/24; (IPC1-7): C23C11/14
Domestic Patent References:
JPS50117647A1975-09-13
JPS5159734A1976-05-25
JPS56169769A1981-12-26
JPS4860031A1973-08-23
Attorney, Agent or Firm:
Tetsuya Mori



 
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