Title:
MANUFACTURE OF SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JPS5837921
Kind Code:
A
Abstract:
PURPOSE:To eliminate photosensitive residual and to improve resolution by first treating the photosensitive material of cyclized rubber system negative type with a developer having a strong developing power, and then treating it with a high resolving power developer after the photosensitive material coating and exposing. CONSTITUTION:A material to be etched formed on the main surface of a semiconductor substrate is coated with the photosensitive material of cyclized rubber system negative type, which is subjected to soft baking, and after cooling it is then exposed with a photo mask positioned on it. After the exposure, treatment is made first with a developer made from aromatic monocyclic hydrocarbon, such as xylene, having a strong developing power to the photosensitive material, then with a developer made from naphtha or one kind of aliphatic hydrocarbon having a good resolving power. After the development rinse is made with acetic ester, etc., hard baking is applied and finally the material to be etched is subjected to etching treatment.
Inventors:
INOUE YOSHIAKI
Application Number:
JP13484581A
Publication Date:
March 05, 1983
Filing Date:
August 29, 1981
Export Citation:
Assignee:
TOKYO SHIBAURA ELECTRIC CO
International Classes:
H01L21/30; G03F7/30; H01L21/027; (IPC1-7): H01L21/30
Attorney, Agent or Firm:
Eiji Morota