Title:
LASER ANNEALING APPARATUS
Document Type and Number:
Japanese Patent JPS5871617
Kind Code:
A
Abstract:
PURPOSE:To enable to irradiate laser beam always at optimum intensity irrespective of a local difference in insulating film substrate construction, by a method wherein a laser beam is controlled by a signal applied from CPU. CONSTITUTION:Laser beam 20 emitted from a laser source 10 is applied to a laser beam intensity controlling part 30 which varies the beam diameter and then stops peripheral part of the beam so as to provide the optimum intensity to the beam. The beam is then applied to a laser beam dimension controlling part 40 which provides the optimum dimension to the beam. The beam is irradiated to a fixed position of a sample table 60 through a laser beam scanning part 50. The intensity and timing of the laser beam is controlled by a laser oscillation controlling part 11 based upon a control signal applied from CPU 70, and are detected and confirmed by a laser beam intensity detecting part 12. The constant intensity thus provided to the beam is controlled to the fixed intensity by the laser beam intensity controlling part 30 based upon the signal from the CPU 70, and the dimension is also controlled to the fixed dimension by the laser beam dimension controlling part 40. The values to be fixed are inputted from a data inputting part 71.
Inventors:
AIZAKI HISAAKI
Application Number:
JP16949581A
Publication Date:
April 28, 1983
Filing Date:
October 23, 1981
Export Citation:
Assignee:
NIPPON ELECTRIC CO
International Classes:
H01L21/268; H01L21/20; (IPC1-7): H01L21/263; H01L21/324
Domestic Patent References:
| JPS5227372A | 1977-03-01 | |||
| JPS52109874A | 1977-09-14 |
Attorney, Agent or Firm:
Uchihara Shin