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Title:
メタルマスク基材、メタルマスク基材の管理方法、メタルマスク、および、メタルマスクの製造方法
Document Type and Number:
Japanese Patent JPWO2017013904
Kind Code:
A1
Abstract:
メタルマスク基材は、レジストが配置されるように構成された金属製の表面を備え、表面に入射した光の正反射における反射率が、４５．２％以上である。

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Inventors:
Tamura Junka
Naoko Mikami
University student Fujito
Kiyoaki Nishitsuji
Takehiro Nishi
Application Number:
JP2016553484A
Publication Date:
April 26, 2018
Filing Date:
March 22, 2016
Export Citation:
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Assignee:
Toppan Printing Co., Ltd.
International Classes:
C23C14/04; H01L51/50; H05B33/10
Domestic Patent References:
JP2015129334A2015-07-16
JPH09209176A1997-08-12
JP2005076068A2005-03-24
JPH11140667A1999-05-25
JP2006233285A2006-09-07
JP5641462B12014-12-17
JP2008041553A2008-02-21
JP2011166018A2011-08-25
JP2004289110A2004-10-14
Foreign References:
WO2005074347A12005-08-11
Other References:
WEAR, vol. 109, JPN6020000121, 1986, pages 69 - 78, ISSN: 0004335941
Attorney, Agent or Firm:
Makoto Onda
Hironobu Onda



 
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