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Document Type and Number:
Japanese Patent JPWO2020245922
Kind Code:
A1
Abstract:
A gate opening, a plurality of first openings arranged in a gate widthwise direction and having a reed shape, a second opening connecting the adjacent first openings, and a third opening connected to a side away from the arrangement of the first opening at an end of the arrangement are formed in an insulation layer. An ohmic cap layer is etched via the openings to form an asymmetric recess region.

Application Number:
JP2021524549A
Publication Date:
December 10, 2020
Filing Date:
June 04, 2019
Export Citation:
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Domestic Patent References:
JP2002184786A2002-06-28
JP2003059944A2003-02-28
JPH10125696A1998-05-15
JP2004214321A2004-07-29
JPH11162994A1999-06-18
JP2019079975A2019-05-23



 
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