Title:
2層レジスト上層用ポジ型シリコーン含有レジスト組成物及びパターン形成方法
Document Type and Number:
Japanese Patent JP4287982
Kind Code:
B2
Inventors:
Shoichiro Anami
Kunihiko Kodama
Kunihiko Kodama
Application Number:
JP2000164640A
Publication Date:
July 01, 2009
Filing Date:
June 01, 2000
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
G03F7/039; C08F30/08; C08K5/00; C08L43/04; C08L101/10; G03F7/075; G03F7/095; G03F7/26; H01L21/027
Domestic Patent References:
| JP5051458A | ||||
| JP11125907A | ||||
| JP7036188A | ||||
| JP7140667A | ||||
| JP7253673A | ||||
| JP10282678A | ||||
| JP8022125A |
Attorney, Agent or Firm:
Takeshi Takamatsu
Kiyozumi Yazawa
Kiyozumi Yazawa