Title:
収差補正器及びマルチ電子ビーム照射装置
Document Type and Number:
Japanese Patent JP7316106
Kind Code:
B2
Abstract:
Aberration corrector includes a lower electrode substrate to be formed therein with plural first passage holes having a first hole diameter and making multiple electron beams pass therethrough, and to be arranged thereon plural electrode sets each being plural electrodes of four or more poles, surrounding a first passage hole, for each of the plural first passage holes, and an upper electrode substrate above the lower one, to be formed therein with plural second passage holes making multiple electron beams pass therethrough, whose size from the top of the upper electrode substrate to the middle of way to the back side of the upper electrode substrate is a second hole diameter, and whose size from the middle to the back side is a third hole diameter larger than each of the first and second hole diameters, wherein a shield electrode is on inner walls of plural second passage holes.
Inventors:
Kazuhiko Inoue
Munehiro Ogasawara
Munehiro Ogasawara
Application Number:
JP2019111578A
Publication Date:
July 27, 2023
Filing Date:
June 14, 2019
Export Citation:
Assignee:
New Flare Technology Co., Ltd.
International Classes:
H01J37/153; H01J37/28
Domestic Patent References:
| JP2005123264A | ||||
| JP2009032691A | ||||
| JP2017107849A |
Attorney, Agent or Firm:
Tetsuma Ikegami
Akira Sudo
Masahiro Koshita
Akira Sudo
Masahiro Koshita
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