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Title:
研磨フィルム及びその製造方法
Document Type and Number:
Japanese Patent JP3924252
Kind Code:
B2
Abstract:
A polishing film includes a plastic film and a polishing layer formed on its surface, having a mixture of a first group of silica particles with a first average diameter and a second group of silica particles with a second average diameter fixed in a resin binder, the first average diameter and the second diameter being different from each other and both within a range of 0.001-10 mum. The mixture of the two groups of silica particles has a granularity distribution curve with two peaks at two different diameter values corresponding to the first and second average diameters.

Inventors:
山▲崎▼ 亨
Tetsuya Baba
Murata Osamu
Application Number:
JP2002589207A
Publication Date:
June 06, 2007
Filing Date:
April 26, 2002
Export Citation:
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Assignee:
Japan Micro Coating Co., Ltd.
NTT Advanced Technology Corporation
International Classes:
B24D11/00; B24B19/22; B24D3/00; B24D3/28; B32B27/14; B05D5/02; G02B6/38
Domestic Patent References:
JP11333731A
JP2001516652A
JP2002239921A
JP8336758A
JP10277957A
JP2000354970A
Foreign References:
WO1999014016A1
Attorney, Agent or Firm:
Sumio Takeuchi
Akira Hori