Title:
研磨材の製造方法
Document Type and Number:
Japanese Patent JP6424818
Kind Code:
B2
Abstract:
The present invention addresses the problem of providing an abrasive containing abrasive particles which is highly producible, is appropriate for precision polishing, and is capable of maintaining the polishing speed of the initial polishing interval for a long time. This abrasive contains abrasive particles comprising: at least 81 mol% in total of one or more types of elements selected from cerium (Ce), lanthanum (La), praseodymium (Pr), neodymium (Nd), samarium (Sm), and europium (Eu); and no more than 19 mol% in total of yttrium (Y), gadolinium (Gd), terbium (Tb), dysprosium (Dy), holmium (Ho), erbium (Er), thulium (Tm), ytterbium (Yb), and lutetium (Lu). Furthermore, the abrasive is characterized in that the monodispersity of the particle diameter of the abrasive particles is 30% or less.
Inventors:
Keisuke Mizoguchi
Akihiro Maezawa
Atsushi Takahashi
Ito Natsuki
Hirayama Natsumi
Hideaki Wakamatsu
Yuki Nagai
Chie Inui
Akihiro Maezawa
Atsushi Takahashi
Ito Natsuki
Hirayama Natsumi
Hideaki Wakamatsu
Yuki Nagai
Chie Inui
Application Number:
JP2015523985A
Publication Date:
November 21, 2018
Filing Date:
June 16, 2014
Export Citation:
Assignee:
Konica Minolta Co., Ltd.
International Classes:
C09K3/14; B24B37/00; B24D3/00; C01F17/229; C01F17/235; H01L21/304
Domestic Patent References:
| JP2009067627A | ||||
| JP2010526433A | ||||
| JP2003020224A | ||||
| JP2008515764A | ||||
| JP2009515807A | ||||
| JP2005126253A |
Foreign References:
| WO2012101871A1 |
Attorney, Agent or Firm:
Gwangyang International Patent Office
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