Title:
ACETAL COPOLYMER AND ITS USE FOR PHOTOSENSITIVE COMPOSITION
Document Type and Number:
Japanese Patent JP2002080528
Kind Code:
A
Abstract:
To obtain a polyvinyl acetal copolymer having high photosensitivity, excellent in adhesiveness to an aluminum substrate, having high print-continuing stability, and further capable of giving such a photosensitive composition that has satisfied quality by using the least possible components (it is preferable from an economical viewpoint) and exhibits the same or partially improved performance in comparison with other compositions known in the current technical level, when the copolymer is used for the photosensitive composition.
This polyvinyl acetal copolymer is obtained by reacting at least two kinds of aldehydes at the same time with a polyvinyl alcohol having a number average molecular weight of 20,000-150,000 g/mol.
Inventors:
GANDINI ALESSANDRO
WAIG FANG SANDRINE
TIMPE HANS-JOACHIM
BAUMANN HARALD
WAIG FANG SANDRINE
TIMPE HANS-JOACHIM
BAUMANN HARALD
Application Number:
JP2001174608A
Publication Date:
March 19, 2002
Filing Date:
June 08, 2001
Export Citation:
Assignee:
KODAK POLYCHROME GRAPHICS CO
International Classes:
B41N1/08; B41N3/03; B41N3/04; C08F8/00; C08F8/28; C08F216/06; C08F216/38; C08F218/02; C08L29/14; C08L79/00; G03F7/00; G03F7/021; G03F7/038; (IPC1-7): C08F8/28; B41N1/08; B41N3/03; B41N3/04; C08F216/06; C08F216/38; C08F218/02; C08L29/14; C08L79/00; G03F7/00; G03F7/021
Attorney, Agent or Firm:
Masatake Shiga (7 outside)
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