Title:
ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2023145501
Kind Code:
A
Abstract:
To provide an acid generator and a resist composition which contain a salt allowing a resist pattern to be produced with good line edge roughness (LER).SOLUTION: There are provided: a salt represented by formula (I) and the like; and a resist composition containing the same. [In the formula, R1-R4 each represent a halogen atom or a perfluoroalkyl group; R5-R7 each represent a halogen atom, a hydroxy group, a perfluoroalkyl group or an alkyl group; and R8 and R9 each represent a hydrogen atom or an alkyl group.]SELECTED DRAWING: None
Inventors:
ADACHI YUKAKO
ICHIKAWA KOJI
ICHIKAWA KOJI
Application Number:
JP2023112916A
Publication Date:
October 11, 2023
Filing Date:
July 10, 2023
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C309/12; G03F7/004; C07C309/17; C07C381/12; C07D321/10; C09K3/00; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP