Title:
酸発生剤、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7425593
Kind Code:
B2
Abstract:
To provide a salt capable of producing a resist pattern having good line edge roughness (LER), an acid generator, and a resist composition containing the acid generator.SOLUTION: The salt represented by formula (I), the acid generator, and the resist composition containing the acid generator are provided. [In the formula, Q1, Q2, Q11 and Q12 each represent a fluorine atom or a perfluoroalkyl group; R1, R2, R11 and R12 each represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z and z1 each represent an integer of 0-6; X1 and X11 each represent *-CO-O-, *-O-CO- or the like; L1, L2 and L11 each represent a single bond or a divalent saturated hydrocarbon group; A1 and A11 each represent an optionally substituted divalent cyclic hydrocarbon group; and Z+ and Z11+ each represent an organic cation.]SELECTED DRAWING: None
Inventors:
Tatsuro Masuyama
Natsuki Okada
Koji Ichikawa
Natsuki Okada
Koji Ichikawa
Application Number:
JP2019229153A
Publication Date:
January 31, 2024
Filing Date:
December 19, 2019
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C09K3/00; C07C309/17; C07C381/12; G03F7/004; G03F7/039; G03F7/20
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Foreign References:
| WO2006132144A1 |
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP
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