To provide a new radiation-sensitive acid generator which exhibits comparatively high combustibility and no bioaccumulation, and produces an acid exhibiting high acidity, high boiling point, moderately short diffusion length in the resist coating, and low dependency to mask pattern density, to provide a sulfonic acid (derivative) related to the acid generator, and to provide a radiation-sensitive resin composition containing the acid generator.
This radiation-sensitive acid generator comprises a compound having a structure of the following formula (I), wherein R is a monovalent organic group having a fluorine content of 50 wt.% or less, wherein an optionally substituted linear or branched monovalent hydrocarbon group, or the optionally substituted monovalent hydrocarbon group represents a group bound to -CO-, -COO-, -S-, -SO-, -SO2-, or the like; Z1 and Z2 represent each a fluorine atom or a perfluoroalkyl group. The radiation-sensitive resin composition comprises the acid generator and further an acid-dissociable group-containing resin in a positive type or an alkali-soluble resin and a cross-linking agent in a negative type.
YONEDA EIJI
NAGAI TOMOKI
TONERI TATSUYA
O ISAMU
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