ACRYLIC ESTER DERIVATIVE

Title:

ACRYLIC ESTER DERIVATIVE

Document Type and Number:

Japanese Patent JP2013227269

Kind Code:

A

Abstract:

To provide novel acrylic ester derivatives having excellent lithography properties such as LWR (Line Width Roughness) to achieve high resolution when used as one of the constituent units of a polymer compound to be contained in a photoresist composition.

Acrylic ester derivatives are represented by general formula (1). In the formula, R¹ is a hydrogen atom or a 1-5C alkyl group; R² is a hydrogen atom, a 1-5C alkyl group, or a 1-5C halogenated alkyl group; X is a 1-5C alkylene group which may include an oxygen atom or a sulfur atom, an oxygen atom, or a sulfur atom.

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Inventors:

TANI YOSHINORI
FUKUMOTO TAKASHI
TAKEDA AKINOBU
IRIE MAKIKO
HIRANO TOMOYUKI
TSUCHIYA JUNICHI

Application Number:

JP2012197773A

Publication Date:

November 07, 2013

Filing Date:

September 07, 2012

Export Citation:

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Assignee:

KURARAY CO
TOKYO OHKA KOGYO CO LTD

International Classes:

C07D327/04; C07D497/18; C08F20/38; G03F7/039; H01L21/027

Domestic Patent References:

JP2006096965A	2006-04-13
JP2008063309A	2008-03-21
JP2010126667A	2010-06-10
JP2005220059A	2005-08-18
JP2010210796A	2010-09-24

Foreign References:

WO2010001913A1	2010-01-07
WO2008081768A1	2008-07-10
WO2006064626A1	2006-06-22
WO2005111097A1	2005-11-24

Attorney, Agent or Firm:

Sumio Tanai
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi

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