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Title:
アクリル酸エステル誘導体、ハロエステル誘導体、高分子化合物およびフォトレジスト組成物
Document Type and Number:
Japanese Patent JP5432141
Kind Code:
B2
Abstract:
An acrylate derivative represented by the following general formula (1): (in the formula, R1 represents a hydrogen atom, a methyl group or a trifluoromethyl group; each of R2, R3, R5, R7, R8, R9 and R10 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkoxy group; each of R4 and R6 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkoxy group, or R4 and R6 are bonded to each other to represent an alkylene group, -O- or -S-; n represents 0, 1 or 2; and W represents an alkylene group or a cycloalkylene group); an intermediate thereof; a method for producing the same; a polymer compound which is obtainable from polymerization of a raw material containing the foregoing acrylate derivative and which is excellent in solubility in an organic solvent used for the preparation of a photoresist composition; and a photoresist composition containing the polymer compound, an organic solvent and a photo acid generator and having excellent adhesion to substrate and less pattern collapse, are provided.

Inventors:
Junko Sato
Osamu Nakayama
Takashi Fukumoto
Application Number:
JP2010519084A
Publication Date:
March 05, 2014
Filing Date:
June 30, 2009
Export Citation:
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Assignee:
KURARAY CO.,LTD.
International Classes:
C07D327/04; C07D497/18; C08F20/38; G03F7/039
Domestic Patent References:
JP2007119696A2007-05-17
JP2005331918A2005-12-02
JP2008083158A2008-04-10
JP2008083159A2008-04-10
JP2008107793A2008-05-08
Attorney, Agent or Firm:
Tamotsu Otani
Makoto Kataoka



 
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