Title:
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
Document Type and Number:
Japanese Patent JP2011075827
Kind Code:
A
Abstract:
To provide an actinic ray-sensitive or radiation-sensitive resin composition excellent in sensitivity, resolution, roughness property, pattern configuration, temporal stability and outgassing property, and to provide a pattern forming method using the composition.
The actinic ray-sensitive or radiation-sensitive resin composition contains a compound which generates an acid represented by general formula (I) upon irradiation with actinic rays or radiation, wherein each symbol has a specific definition.
Inventors:
KAWABATA KENJI
TSUCHIMURA TOMOTAKA
TSUCHIMURA TOMOTAKA
Application Number:
JP2009227029A
Publication Date:
April 14, 2011
Filing Date:
September 30, 2009
Export Citation:
Assignee:
FUJIFILM CORP
International Classes:
G03F7/004; C07C25/18; C07C317/12; C07C317/14; C07C381/12; C07D209/30; C07D327/08; C07D333/46; C07D333/76; C09K3/00; G03F7/038; G03F7/039; H01L21/027
Attorney, Agent or Firm:
Kurata Masatoshi
Satoshi Kono
Makoto Nakamura
Yoshihiro Fukuhara
Takashi Mine
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Kocho Chojiro
Naoki Kono
Katsu Sunagawa
Katsumura Hiro
Shoji Kawai
Tatsushi Sato
Takashi Okada
Mihoko Horiuchi
Takenori Masanori
Takuzo Ichihara
Yamashita Gen
Satoshi Kono
Makoto Nakamura
Yoshihiro Fukuhara
Takashi Mine
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Kocho Chojiro
Naoki Kono
Katsu Sunagawa
Katsumura Hiro
Shoji Kawai
Tatsushi Sato
Takashi Okada
Mihoko Horiuchi
Takenori Masanori
Takuzo Ichihara
Yamashita Gen
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