Title:
感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法
Document Type and Number:
Japanese Patent JP7200267
Kind Code:
B2
Abstract:
The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition having excellent storage stability during long-term storage. In addition, also provided are a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a compound represented by General Formula (I) and an acid-decomposable resin.M1+A−-L-B−M2+ (I)
Inventors:
Minoru Uemura
Masashi Kojima
Kenyoshi Goto
Kei Yamamoto
Takashi Kawashima
Masashi Kojima
Kenyoshi Goto
Kei Yamamoto
Takashi Kawashima
Application Number:
JP2020569478A
Publication Date:
January 06, 2023
Filing Date:
January 10, 2020
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
G03F7/004; C07D317/72; C07D327/06; C07D333/46; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2011053364A | ||||
| JP2014149409A |
Attorney, Agent or Firm:
Hideaki Ito
Fumio Mihashi
Fumio Mihashi