Title:
感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、及び、電子デバイスの製造方法
Document Type and Number:
Japanese Patent JP7356568
Kind Code:
B2
Abstract:
The present invention provides: an actinic ray-sensitive or radiation-sensitive resin composition, represented by specific general formula (1), containing (A) a resin, and (B) a compound that produces an acid when irradiated with actinic rays or radiation; an actinic ray-sensitive or radiation-sensitive film formed by the actinic ray-sensitive or radiation-sensitive resin composition; a method for forming a pattern; and a method for manufacturing an electronic device.
Inventors:
Naoya Hatakeyama
福▲崎▼ 英治
Fumihiro Yoshino
福▲崎▼ 英治
Fumihiro Yoshino
Application Number:
JP2022503286A
Publication Date:
October 04, 2023
Filing Date:
February 16, 2021
Export Citation:
Assignee:
Fujifilm Corporation
International Classes:
G03F7/004; C07D217/08; C07D277/04; C07D279/12; C07D285/16; C07D327/02; C07D327/04; C07D327/06; C07D327/10; C07D339/00; C07D409/06; C07D493/18; C09K3/00; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2014048500A | ||||
| JP2014199389A |
Attorney, Agent or Firm:
Patent Attorney Corporation Koei Office
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