Title:
感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、フォトマスク、電子デバイスの製造方法、及び化合物
Document Type and Number:
Japanese Patent JP7358627
Kind Code:
B2
Abstract:
The present invention provides: an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin in which polarity is increased due to acid activity, and (B) a compound which is represented by a specific general formula and produces an acid due to irradiation with actinic rays or radiation; an actinic ray-sensitive or radiation-sensitive film formed by using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern formation method; a photomask; and an electronic device manufacturing method; and a compound.
Inventors:
福▲崎▼ 英治
Taro Miyoshi
Taro Miyoshi
Application Number:
JP2022511859A
Publication Date:
October 10, 2023
Filing Date:
March 17, 2021
Export Citation:
Assignee:
Fujifilm Corporation
International Classes:
G03F7/004; C07D275/06; C07D307/00; C07D307/81; C07D309/12; C07D309/30; C07D327/06; C07D327/08; C07D333/34; C07D333/46; C07D333/76; C07D335/02; C09K3/00; G03F7/039
Domestic Patent References:
| JP2002268217A | ||||
| JP2009209248A | ||||
| JP2019112394A |
Attorney, Agent or Firm:
Patent Attorney Corporation Koei Office