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Title:
ACTIVE MATRIX SUBSTRATE
Document Type and Number:
Japanese Patent JP3801271
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To improve mechanical and physical properties in a high-temperature region by coating a composition containting fluororesin soluble in a solvent and having a hydrophilic functional group in the molecule and a partial hydrolysis condensate of a specific alkoxysilane as an insulation film under pixel electrode of an active matrix substrate. SOLUTION: A coating film made of a coating composition containing a fluororesin soluble in a solvent and having a hydrophilic functional group in a molecule, and a partial hydrolysis condensate of alkoxysilane expressed by a formula R1mR2nSi (OR3)4-m-4(R1 and R2 are non-hydrolysis groups, R3 is an alkyl group, m and n are integers from 0 to 3 satisfying 0≤m+n≤3) are applied as an insulation film under pixel electrode 5. By doing so, mechanical and physical properties can be considerably improved, and uniform coating can be achieved with a high reliability when exposed to high temperature.

Inventors:
Kunio Masushige
Naoki Kato
Shunsuke Yokotsuka
Application Number:
JP23092496A
Publication Date:
July 26, 2006
Filing Date:
August 30, 1996
Export Citation:
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Assignee:
Asahi Glass Co., Ltd.
International Classes:
C09D127/12; G02B5/00; B32B27/30; C09D129/10; C09D183/04; G02F1/1333; G02F1/1343; G02F1/136; G02F1/1368; H01L29/786; (IPC1-7): H01L29/786; C09D127/12; C09D129/10; C09D183/04; G02B5/00; G02F1/1333; G02F1/1343; G02F1/136; //B32B27/30
Domestic Patent References:
JP6175156A
JP4173881A
JP6222390A