Title:
ACTIVE RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE RAY- OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD, AND ELECTRONIC DEVICE PRODUCTION METHOD
Document Type and Number:
Japanese Patent JP2018189759
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide, e.g., an active ray- or radiation-sensitive resin composition excellent in PED stability and PEBs.SOLUTION: An active ray- or radiation-sensitive resin composition comprises: a resin (A) having a repeating unit represented by the general formula (a-1) or (a-2) described in the specification; and a photoacid generator (B) represented by the general formula (b-1) or (b-2). Also provided are an active ray- or radiation-sensitive film, a pattern formation method, and an electronic device production method including the pattern formation method.SELECTED DRAWING: None
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| JPS61219041 | DOT MATRIX TYPE COLOR PRINTER |
| WO/2004/107051 | PHOTOACID GENERATORS WITH PERFLUORINATED MULTIFUNCTIONAL ANIONS |
Inventors:
YAMAMOTO KEIJI
SAKIDA KYOHEI
TANAKA TAKUMI
O KEIYU
KATO KEITA
SAKIDA KYOHEI
TANAKA TAKUMI
O KEIYU
KATO KEITA
Application Number:
JP2017090814A
Publication Date:
November 29, 2018
Filing Date:
April 28, 2017
Export Citation:
Assignee:
FUJIFILM CORP
International Classes:
G03F7/004; C08F28/02; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2016057415A | 2016-04-21 | |||
| JP2015194703A | 2015-11-05 |
Attorney, Agent or Firm:
Patent Business Corporation Koei Patent Office