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Patent Searching and Data


Title:
ACTIVE TYPE THIN FILM COLD CATHODE AND ITS MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2002100281
Kind Code:
A
Abstract:

To provide an active type thin film cold cathode which is capable of extracting a large current even at a low voltage, and its manufacturing method.

This cold cathode has layers on a Si substrate 1 formed from bottom to top in the following order: a boron nitride film 2, a SiO2 layer 3 and a metal thin film 4. Opening parts are formed in the SiO2 layer 3 and a metal thin film 4, where the boron nitride film 2 is exposed. The metal thin film 4 is grounded and a negative voltage is applied to the Si substrate 1 or the boron nitride film 2. A large electric field is generated in the SiO2 layer 3 even by a small potential difference because of its small thickness, therefore, electrons 6 are emitted from the boron nitride film 2. The emitted electrons reach an anode 5 by accelerated with a potential field applied between the metal thin film 4 and the anode 5.


Inventors:
IKEDA JUNJI
Application Number:
JP2001214626A
Publication Date:
April 05, 2002
Filing Date:
July 16, 2001
Export Citation:
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Assignee:
NIKON CORP
International Classes:
H01J9/02; H01J1/304; (IPC1-7): H01J1/304; H01J9/02
Attorney, Agent or Firm:
Toshiaki Hosoe