To provide new adamantane derivatives which are expected as raw materials for polymers having high resistance to dry etching and excellent transparency even in a short wavelength, particularly as raw materials for resist resins useful for F2 excimer laser beam.
The adamantane derivatives are each represented by formulas (I), (II), (III), (IV) and (V) wherein R1, R2 and R3 are each H or a 1-20C hydrocarbon group which may have a halogen atom, a hetero atom or a polymerizable group; X is a halogen atom or a 1-20C hydrocarbon group which may have a halogen atom or a hetero atom; Y is a single bond or a divalent connecting group; Z is a single bond or trivalent connecting group; n is 0 or an integer of ≥1; In R1 and R2 in general formula (I), R1, R2 and R3 in general formulas (II), (III) and (IV), R1 and R3 in general formula (V), at least one group thereof is a hydrocarbon group having a polymerizable group.
TANAKA SHINJI
YOSHITOME SHUNEI
KODOI KOICHI
HATAKEYAMA NAOYOSHI
Masamichi Tohei