Title:
アディティブ製造技術（ＡＭＴ）低プロファイル放射器
Document Type and Number:
Japanese Patent JP6976433
Kind Code:
B2
Abstract:
Described herein is a low profile radiator (LPR) manufactured using additive manufacturing technology (AMT). Such an AMT radiator is suitable for use in an array antenna which may be fabricated using AMT manufacturing processes.
Inventors:
Haven, John, Pee.
Shikina, Thomas, V.
Adams, Peter, Jay.
Benedict, James, E.
Shikina, Thomas, V.
Adams, Peter, Jay.
Benedict, James, E.
Application Number:
JP2020525916A
Publication Date:
December 08, 2021
Filing Date:
November 05, 2018
Export Citation:
Assignee:
RAYTHEON COMPANY
International Classes:
H01Q13/10; H01P11/00; H01Q5/357; H01Q21/06; H05K1/02; H05K1/11; H05K3/40
Domestic Patent References:
| JP2006514483A | ||||
| JP2005236672A | ||||
| JP2007243296A | ||||
| JP2004087656A | ||||
| JP2002271133A |
Foreign References:
| US20080191950 |
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito
Osamu Miyazaki
Tadahiko Ito
Osamu Miyazaki
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