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Title:
AGENT FOR IMPARTING RESISTANCE TO CONTAMINATION AND CONTAMINATION-RESISTANT ARTICLE USING THE SAME
Document Type and Number:
Japanese Patent JP2008285686
Kind Code:
A
Abstract:

To provide an agent which enables formation of a coating film having excellent resistance to stain caused by fingerprint/resistance to stain caused by serum and simultaneously having excellent hardness, scratch resistance, transparency and low curling property, or the like and which can preferably be used for wide applications such as touch-resistant panels, displays, housing for cellular phones, optical discs, or the like.

The agent for imparting resistance to contamination comprises a (meth)acrylic copolymer (A) containing (meth)acrylate having a water repellent group not containing silicon and fluorine as a copolymer component or a composite of the copolymer (A) with inorganic oxide fine particles, and preferably further an organic compound having a (meth)acryloyl group curable with active energy beam.


Inventors:
TERAUCHI MAKOTO
HAYAMA KAZUHIDE
Application Number:
JP2008213499A
Publication Date:
November 27, 2008
Filing Date:
August 22, 2008
Export Citation:
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Assignee:
MITSUBISHI CHEM CORP
International Classes:
C09K3/00; C08F2/44; C08F220/10; C08F265/06; C08F292/00
Domestic Patent References:
JPH06158019A1994-06-07
JPH107755A1998-01-13
JP4517590B22010-08-04
Attorney, Agent or Firm:
Shisei Patent Office