Title:
ALIGNER, EXPOSURE METHOD, AND MANUFACTURE OF DISPLAY DEVICE
Document Type and Number:
Japanese Patent JPH11251219
Kind Code:
A
Abstract:
To provide an aligner, exposure method, and a method for manufacturing a display device wherein, in relation to an aligner for screen compositing, unevenness in partitions on a sensitized substrate caused by exposure amount is reduced.
A pattern on a reticle 9 is exposed and developed on a sensitized substrate 11 so that parts of a plurality of partitions overlap each other, brightness of a resist image in each region and overlapped regions is detected, and the position of a reticle blind 6 and driving during exposure are controlled (16) according to the difference in brightness for controlling the exposure amount, thus unevenness in partitions is reduced.
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Inventors:
HORI KAZUHIKO
Application Number:
JP4918898A
Publication Date:
September 17, 1999
Filing Date:
March 02, 1998
Export Citation:
Assignee:
NIKON CORP
International Classes:
H01L21/027; G03F7/20; G03F7/22; (IPC1-7): H01L21/027; G03F7/22
Attorney, Agent or Firm:
Yusuke Hiraki (1 person outside)
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