ALIGNER AND METHOD THEREFOR, AND MANUFACTURE OF SEMICONDUCTOR DEVICE

Title:

ALIGNER AND METHOD THEREFOR, AND MANUFACTURE OF SEMICONDUCTOR DEVICE

Document Type and Number:

Japanese Patent JP3244076

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To transfer a pattern, while keeping it high in resolution and large in focal depth.
SOLUTION: This exposure system is equipped with an illuminating optical system which has a mask 27 irradiated with illuminating light and a projection optical system which projects an illuminating light onto a substrate 30, and a mask pattern is transferred onto a substrate through irradiation with illumination light. A deflecting member 12 is provided for converting illumination light into light fluxes that travel in different directions, so as to impinge on the mask 27 at angles with the optical axis of the projection optical system 29 corresponding to the fineness of the mask 27.

Inventors:

Naomasa Shiraishi

Application Number:

JP20679499A

Publication Date:

January 07, 2002

Filing Date:

November 15, 1990

Export Citation:

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Assignee:

NIKON CORPORATION

International Classes:

H01L21/027; G03F7/20; (IPC1-7): H01L21/027; G03F7/20

Domestic Patent References:

JP4180612A
JP1109720A
JP6191662A
JP61289632A

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