PURPOSE: To inexpensively perform an accurate proximity exposure without measuring its flatness by introducing a measuring instrument to a gap between a mask and a substrate, uniformly setting the gap with the value, removing the instrument after setting is finished, and moving the mask or the substrate elevationally in parallel to set a desired gap amount.
CONSTITUTION: A substrate 11 is set under a mask 5. Then, a gap measuring instrument 8 calibrated between calibration gaps 10 is moved, and a substrate deformation chuck 13 is so driven that the gap 20 becomes a predetermined value. The chuck 13 is elevationally driven by a controller 17 with a gap measured value. When the instrument 8 is passed between the mask 5 and the substrate 1, the gap 20 becomes constant. If the gap 20 is confirmed to fall within an allowable value when the instrument 8 is returned to the gap 10, the chuck 13 is raised by an elevational driving system 14 whole the value of an elevational movement sensor 15 is monitored, it is temporarily stopped at a gap of several 100μm. Here, the substrate 11, the mask 8 are aligned by an alignment optical system 2, the chuck 13 is raised after the alignment is finished, it is set to a predetermined gap value S, and exposed with parallel ultraviolet light 30.
KUNI TOMOHIRO
AKIYAMA NOBUYUKI
