Title:
ALIGNMENT MARK
Document Type and Number:
Japanese Patent JP2022137773
Kind Code:
A
Abstract:
To provide a technique for realizing an alignment mark which satisfies measurement accuracy required for positioning a substrate.SOLUTION: An alignment mark is provided in a silicon carbide substrate in which a <0001>c-axis is inclined only by a prescribed angle in a <11-20> direction from the normal direction of a principal surface. The alignment marks are linearly symmetrical in the <11-20> direction and a <1-100> direction when viewed from the normal direction of the principal surface. The alignment mark has a pair of reentrant angles directing in an opposite direction each other in the <11-20> direction when viewed from the normal direction, and all the sides are a recessed polygon crossing the <1-100> direction. The difference dXY (unit is nanometer) of measurement accuracy as accuracy required for alignment mark position measurement, between in the <11-20> direction and the <1-100> direction, and a size of the reentrant angle AG (unit is degree) satisfy a relation of AG≥{360-(dXY+1298)/27}.SELECTED DRAWING: Figure 3
Inventors:
WAKASUGI YUKIHIRO
Application Number:
JP2021037439A
Publication Date:
September 22, 2022
Filing Date:
March 09, 2021
Export Citation:
Assignee:
DENSO CORP
TOYOTA MOTOR CORP
MIRISE TECH CORP
TOYOTA MOTOR CORP
MIRISE TECH CORP
International Classes:
G03F9/00; G03F7/20
Attorney, Agent or Firm:
Patent Attorney Corporation Kaiyu International Patent Office
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