Title:
アライメント方法、アライメント装置、及び有機EL素子製造装置
Document Type and Number:
Japanese Patent JP5539154
Kind Code:
B2
Abstract:
A method of carrying out alignment between a substrate and a mask, each having respective alignment marks. Vibrations attic substrate in a direction of gravity are measured. An antiphase vibrational wave is calculated, based an data corresponding to the measured vibrations. The antiphase vibrational wave is applied to the substrate, thereby reducing the vibrations or the substrate. When the vibrations of the substrate in the direction of gravity fall within a predetermined value that is set in advance, images are taken of relative positions of the alignment marks provided on the substrate and the mask, respectively, from the substrate side, and corresponding data is produced. Based on the data corresponding to the obtained images, an amount of movement of one of the substrate and the mask is calculated in a horizontal direction. One of the substrate and the mask is moved, based on the calculated movement amount.
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Inventors:
Naoto Fukuda
Application Number:
JP2010240757A
Publication Date:
July 02, 2014
Filing Date:
October 27, 2010
Export Citation:
Assignee:
Canon Inc
International Classes:
C23C14/04; C23C14/24; H01L51/50; H05B33/10
Domestic Patent References:
| JP2008198500A | ||||
| JP2006176809A | ||||
| JP2008293841A | ||||
| JP2003017258A |
Foreign References:
| WO2010106958A1 |
Attorney, Agent or Firm:
Keisuke Watanabe
Yoshihiro Yamaguchi
Yoshihiro Yamaguchi