Title:
AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JP2023046675
Kind Code:
A
Abstract:
To provide a chemically amplified resist composition which exhibits high sensitivity and improved LWR and CDU regardless of whether it is positive or negative, and a pattern forming method using the same.SOLUTION: There are provided: an amine compound represented by the following formula (1); and the chemically amplified resist composition containing a quencher comprising the amine compound.SELECTED DRAWING: None
Inventors:
FUKUSHIMA MASAHIRO
OHASHI MASAKI
KATAYAMA KAZUHIRO
OHASHI MASAKI
KATAYAMA KAZUHIRO
Application Number:
JP2021155395A
Publication Date:
April 05, 2023
Filing Date:
September 24, 2021
Export Citation:
Assignee:
SHINETSU CHEMICAL CO
International Classes:
C07D209/94; C07D275/06; C07D307/68; C07D307/93; C07D327/04; C07D493/18; C08F12/22; C08F20/10; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Patent Attorney Corporation Eimei International Patent Office