Title:
両性解離型イオン交換媒体、並びに使用方法及び分離容量のキャリブレーション方法
Document Type and Number:
Japanese Patent JP7111373
Kind Code:
B2
Abstract:
An amphoteric dissociation ion exchange medium. The surface of the amphoteric dissociation ion exchange medium is an amphoteric dissociation covalent modification layer. When an environmental pH value is lower than an isoelectric point of the amphoteric dissociation covalent modification layer, the surface net charge of the amphoteric dissociation covalent modification layer is positive, so that the amphoteric dissociation covalent modification layer has the property of anion exchanger; when the environmental pH value is higher than isoelectric point of the amphoteric dissociation covalent modification layer, the surface net charge of the amphoteric dissociation covalent modification layer is negative, so that the amphoteric dissociation covalent modification layer has the property of cation exchanger. The separation medium respectively has the property of the anion exchanger and the cation exchanger at the two sides of the isoelectric point, so that by adjusting the pH value of an eluant, the net charges on the surface of the separation medium and a target substance are same, so that a target substance can be released due to electrostatic repulsion, the elution effect is enhanced and subsequent problems due to application of high-concentration inorganic ions are avoided. The novel ion exchange medium has a high separation capacity, a high elution effect on the absorbed ions in a moderate condition, can accurately calibrate a separation capacity, has low non-specific adsorption to hydrophobic small molecules, and has a high regeneration effect in the moderate condition.
Inventors:
Flight
Dragon high wave
Rei Xie
Yellow
Xiamen
Dragon high wave
Rei Xie
Yellow
Xiamen
Application Number:
JP2019530832A
Publication Date:
August 02, 2022
Filing Date:
October 24, 2018
Export Citation:
Assignee:
CHONGQING BOLANYING (BLY) BIOTECHNOLOGY CO., LTD., CHINA
International Classes:
B01J43/00; B01J20/281; B01J47/014; B01J49/50; G01N21/27; G01N30/02
Domestic Patent References:
| JP200677037A | ||||
| JP5068981A | ||||
| JP5876145A | ||||
| JP3501446A |
Foreign References:
| US20090005265 | ||||
| CN102993229A | ||||
| US6420439 |
Attorney, Agent or Firm:
Goto Patent Office
SK Patent Attorney Corporation
Akihiko Okuno
Hiroyuki Ito
SK Patent Attorney Corporation
Akihiko Okuno
Hiroyuki Ito
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