Title:
ANTIFOG AND ANTISTAIN ARTICLE AND METHOD FOR MANUFACTURING THE SAME
Document Type and Number:
Japanese Patent JP3925179
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide an antifog and antistain article having sufficient mechanical durability and photocatalytic activity, and to provide a method for manufacturing the same.
SOLUTION: In the antifog and antistain article for manufacturing the article a film 11 comprising a metal oxide semiconductor having photocatalytic activity and a film 12 essentially comprising silica formed by reactive sputtering under the condition of ≥0.8 Pa pressure during depositing the film are formed on a transparent substrate 10.
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Inventors:
Takuji Oyama
Hidefumi Odaka
Yuzo Shigesato
Hidefumi Odaka
Yuzo Shigesato
Application Number:
JP2001377366A
Publication Date:
June 06, 2007
Filing Date:
December 11, 2001
Export Citation:
Assignee:
Asahi Glass Co., Ltd.
International Classes:
C03C17/34; B01J35/02; B01J37/02; B01J37/08; C23C14/08; C23C14/34; (IPC1-7): C03C17/34; B01J35/02; B01J37/02; B01J37/08; C23C14/08; C23C14/34
Domestic Patent References:
| JP2001287972A |
Foreign References:
| WO2002004376A1 |