Title:
ANTIFOGGING BASE MATERIAL AND METHOD FOR FORMING THE SAME
Document Type and Number:
Japanese Patent JP3585418
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain an antifogging base material excellent in antifogging properties, water wiping resistance and abrasion resistance and capable of keeping antifogging capacity over a long period of time.
SOLUTION: The antifogging base material is obtained by laminating a protective film with a thickness of 3-10 nm having water permeability to a water absorbable composite film comprising a mixture of a polyvinyl acetal resin with a degree of acetalization of 10 mol% or less and a hydrolysate or partial hydrolysate of silyl isocyanate.
Inventors:
Noboru Murata
Seiji Yamazaki
Seiji Yamazaki
Application Number:
JP2000114517A
Publication Date:
November 04, 2004
Filing Date:
April 17, 2000
Export Citation:
Assignee:
Central Glass Co., Ltd.
International Classes:
G02B1/10; B05D5/00; B05D7/24; B32B27/30; C03C17/34; C09K3/18; G02B1/14; (IPC1-7): B32B27/30; B05D5/00; B05D7/24; C03C17/34; C09K3/18; G02B1/10
Domestic Patent References:
| JP6158031A | ||||
| JP49070885A | ||||
| JP2001146585A |
Attorney, Agent or Firm:
Yoshiyuki Nishi