Title:
抗原曝露室及びその洗浄・乾燥方法
Document Type and Number:
Japanese Patent JP4750798
Kind Code:
B2
Abstract:
An antigen exposure chamber for quickly performing cleaning and drying with high quality is provided. The antigen exposure chamber of the present invention includes: a cleaning water supply device for supplying cleaning water for cleaning the antigen exposure chamber; cleaning nozzles for jetting the cleaning water supplied from the cleaning water supply device into the antigen exposure chamber and ducts of fan units to clean the antigen exposure chamber and the ducts; a floor surface of the antigen exposure chamber; and an exhaust device provided below the floor surface to exhaust air from the floor surface of the antigen exposure chamber and collect and drain the cleaning water during cleaning.
Inventors:
Toshio Fujita
Yuu Peng
Akihiro Seta
Minoru Okuda
Kazuhiro Hashiguchi
Kimihiro Okubo
Yuu Peng
Akihiro Seta
Minoru Okuda
Kazuhiro Hashiguchi
Kimihiro Okubo
Application Number:
JP2007537501A
Publication Date:
August 17, 2011
Filing Date:
September 28, 2005
Export Citation:
Assignee:
Shinryo Corporation
International Classes:
C12M1/00; B08B3/02; B08B3/10; G01N33/53
Domestic Patent References:
| JPH1183386A | 1999-03-26 | |||
| JP2004275881A | 2004-10-07 |
Attorney, Agent or Firm:
Kazuo Shamoto
Shinjiro Ono
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Tadashi Masui
Shinjiro Ono
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Tadashi Masui