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Patent Searching and Data


Title:
ANTIMICROBIAL COMPOSITION
Document Type and Number:
Japanese Patent JPH11180806
Kind Code:
A
Abstract:

To obtain the subject composition reduced and stabilized in skin irradiating property and improved in workability for injecting chemicals and storage stability by dissolving an isothiazolone compound and a specific compound into a solvent.

This antimicrobial composition is obtained by formulating (A) an isothiazolone-based compound of formula I or formula II [R is H, an alkyl or the like; X is condensed with Y to form a benzene ring; M is a cation of an alkali (earth)metal: Z is an anion forming a compound with M having solubility enough to form a complex compound; (a) is 1 or 2; (n) is an integer in which Z satisfies an atomic valence of M] (e.g. 5-chloro-2-methyl-4-isothiazolin-3-one) with (B) a compound capable of reducing skin-irritating property of the component A at (1:0.1) to 50 molar ratio of the component A to the component B and dissolving the mixture into (C) a solvent. A dicarboxylic acid, an aromatic carboxylic acid, a phenolic compound, an alcohol-based compound, an amide- based compound is preferable as the component B.


Inventors:
YAGI MINORU
AOKI TETSUYA
Application Number:
JP35318197A
Publication Date:
July 06, 1999
Filing Date:
December 22, 1997
Export Citation:
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Assignee:
KURITA WATER IND LTD
International Classes:
A01N25/22; A01N43/80; A01N25/02; (IPC1-7): A01N43/80; A01N25/02; A01N25/22
Attorney, Agent or Firm:
Tsuyoshi Shigeno