ANTISTATIC MATERIAL AND ANTISTATIC FILM PREPARED THEREWITH

Title:

ANTISTATIC MATERIAL AND ANTISTATIC FILM PREPARED THEREWITH

Document Type and Number:

Japanese Patent JP2018028079

Kind Code:

A

Abstract:

PROBLEM TO BE SOLVED: To provide an antistatic material that expresses high-level antistatic performance while being thin, and also has transparency, and an antistatic film prepared therewith.SOLUTION: An antistatic material contains a compound (A) having a polythiophene structure, a polyisoprene sulfonic acid derivative compound (B), and an epoxy compound (C).SELECTED DRAWING: None

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Inventors:

MORISHITA KENTA
OKOCHI MOTOHIRO
NAKAMURA SATOSHI
HAYANO TOMOKO

Application Number:

JP2017153059A

Publication Date:

February 22, 2018

Filing Date:

August 08, 2017

Export Citation:

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Assignee:

TORAY INDUSTRIES

International Classes:

C09K3/16; B32B27/00; B32B27/18; B32B27/38; C08J7/04; C08L15/00; C08L63/00; C08L65/00; H05F1/00

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