Title:
抗ウイルス性および抗細菌性呼吸器マスク
Document Type and Number:
Japanese Patent JP2005512641
Kind Code:
A
Abstract:
The invention provides a gas mask comprising a face piece including a transparent eye covering, and including a space to allow air to circulate around the nose and mouth of a wearer, and having an airtight seal to prevent contaminated air from entering the gas mask; a filtration apparatus containing an active stage and a passive stage, the passive stage for filtering out particles above a predetermined size, and including adsorbent media for removing toxic or harmful substances and fluids from the contaminated air, the active stage containing at least one agent to kill ambient bacteria and viruses; an intake vent permitting contaminated air to enter into the filtration system; at least one passageway connecting the filtration apparatus to the space around the nose and mouth of the wearer; and an exhalation port through which exhaled air may be expelled.
Inventors:
Wen, Sherry H.
Application Number:
JP2003552388A
Publication Date:
May 12, 2005
Filing Date:
December 18, 2002
Export Citation:
Assignee:
Wen, Sherry H.
International Classes:
A62B17/04; A62B7/10; A62B18/02; A62B23/02; (IPC1-7): A62B17/04; A62B7/10; A62B23/02
Attorney, Agent or Firm:
Hidesaku Yamamoto
Takaaki Yasumura
Natsuki Morishita
Takaaki Yasumura
Natsuki Morishita