Title:
DEVICE FOR PERFORMING DEPOSITION PROCESS ON SUBSTRATE, AND METHOD OR EXHAUSTING PROCESSING GAS FROM DEVICE FOR PERFORMING DEPOSITION PROCESS ON SUBSTRATE
Document Type and Number:
Japanese Patent JP2023032743
Kind Code:
A
Abstract:
To provide a technology for suppressing a deterioration in gas separation performance and a deterioration in exhaust speed in exhausting first processing gas and second processing gas from a neighborhood of a rotation center of a rotary table through respectively different exhaust paths.SOLUTION: A device includes: a rotating shaft exhaust path connected to a rotary table to rotate it and formed with an exhaust path formed therein, for mounting and rotating a plurality of substrates on the rotary table to alternatively pass them through a supply region of first processing gas and a supply region of second processing gas to form a thin film on the substrates; and a ceiling surface side exhaust path formed so as to vertically penetrate a member constituting a central area of a top plate of a vacuum container. The first processing gas is exhausted to the rotation shaft exhaust path through a first exhaust port, and second processing gas is exhausted to the ceiling surface side exhaust path through a second exhaust path.SELECTED DRAWING: Figure 1
Inventors:
HONMA MANABU
Application Number:
JP2021139042A
Publication Date:
March 09, 2023
Filing Date:
August 27, 2021
Export Citation:
Assignee:
TOKYO ELECTRON LTD
International Classes:
H01L21/31; C23C16/44; H01L21/316
Attorney, Agent or Firm:
Patent Attorney Corporation Yayoi Patent Office
Previous Patent: JPWO2023032742
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