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Title:
APPARATUS FOR EXAMINING FOREIGN MATERIAL ON SURFACE
Document Type and Number:
Japanese Patent JPH04157352
Kind Code:
A
Abstract:

PURPOSE: To simultaneously examine a front surface and a rear face of a semiconductor wafer by providing a means for rotating a jig.

CONSTITUTION: He-Ne laser light 5 is applied from a light source 3 onto a surface of a wafer 2, and reflected or scattered light 5 is detected by a detector 4 to know whether or not a foreign material exists. At this time a wafer fixing jig 1 can rotate in a direction indicated by an arrow and both the front surface and a rear face of the wafer 2 can be directed to the light source 3. Therefore both the front surface and the rear face of the wafer 2 can be examined as for foreign materials at one time. It is also possible to prevent dust from occurring and from attaching to the rear face of the wafer 2.


Inventors:
OKIZAKI HIROAKI
Application Number:
JP28248690A
Publication Date:
May 29, 1992
Filing Date:
October 19, 1990
Export Citation:
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Assignee:
NEC YAMAGATA LTD
International Classes:
G01N21/84; G01N21/88; G01N21/94; G01N21/95; G01N21/956; H01L21/66; (IPC1-7): G01N21/84; G01N21/88; H01L21/66
Domestic Patent References:
JPH0260860B21990-12-18
JPS63124942A1988-05-28
Attorney, Agent or Firm:
Naoki Kyomoto (2 outside)