Title:
APPARATUS FOR MAKING WASHING WATER OR DIPPING WATER USED IN PRODUCTION OF SEMICONDUCTOR
Document Type and Number:
Japanese Patent JP2003136077
Kind Code:
A
Abstract:
To provide an apparatus capable of efficiently making washing water or dipping water, capable of suppressing the oxidation of a semiconductor device at the time of washing or dipping treatment in a semiconductor device manufacturing process.
A hydrogen dissolving device 2 is connected to an ultrapure water making apparatus and hydrogen is dissolved in ultrapure water in the hydrogen dissolving device 2 to make hydrogen dissolved water which is, in turn, guided to a washing apparatus 5 or a dipping apparatus 6 through a liquid sending line 7. The hydrogen dissolved water discharged from the liquid sending line 7 suppresses the oxidation of the semiconductor device in washing or dipping treatment.
Inventors:
AOKI HIDEMITSU
TOMIMORI HIROAKI
YAMAMOTO KENICHI
HIRANO KEIJI
TAIRA TSUTOMU
YAMASHITA KOFUKU
FUTATSUGI TAKASHI
TOMIMORI HIROAKI
YAMAMOTO KENICHI
HIRANO KEIJI
TAIRA TSUTOMU
YAMASHITA KOFUKU
FUTATSUGI TAKASHI
Application Number:
JP2001334841A
Publication Date:
May 13, 2003
Filing Date:
October 31, 2001
Export Citation:
Assignee:
NEC CORP
ORGANO KK
ORGANO KK
International Classes:
C02F1/68; C01B3/00; C11D11/00; H01L21/00; H01L21/02; H01L21/304; H01L21/306; H01L21/321; H01L21/768; C02F1/32; C02F1/44; C02F1/66; C02F1/70; C02F9/00; (IPC1-7): C02F1/68
Attorney, Agent or Firm:
Hosoi Isamu