To provide an apparatus for manufacturing an electrophotographic photoreceptor capable of forming a defect-free deposited film uniform in film thickness, film quality and surface properties by high-speed uniform plasma treatment of a substrate having a large area.
In the apparatus for manufacturing an electrophotographic photoreceptor by forming a deposited film comprising a non-monocrystalline material containing at least silicon on a surface of a cylindrical substrate 101 set in an evacuatable vertical reaction vessel 102, the interior of the reaction vessel 102 is equipped with a high-frequency electrode 104 to which high-frequency power can be supplied, and a shielding plate 118 which is situated between the bottom 117 of the reaction vessel 102 and the underpart of the substrate 101, comprises a dielectric material, and has a plurality of openings. This shielding plate 118 prevents suspension of dust and peeled film chips near the bottom 117 and adhesion of these to the substrate 101. A plurality of high-frequency powers different from each other in frequency are simultaneously supplied to the high-frequency electrode 104.
AOKI MAKOTO
OZAWA TOMOHITO
Katsuhiro Ito
Ishibashi Masayuki